Product description
Pedestal assembly, 200 mm etch, with SXTAL / nickel insert descriptors where applicable.
Specifications and identifiers
details
| Wafer size | 200 mm |
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| Process context | Etch |
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| Additional descriptor | SXTAL, Ni inserts, 56G3431 referenced |
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identification
| Normalized item type | Pedestal assembly |
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| Supported description | Pedestal assembly, 200 mm etch, with SXTAL / nickel insert descriptors where applicable. |
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Applications
PVD/CVD/etch process chamberselectrostatic chuck assembliesdeposition shields, liners, rings, and coversWafer support in an etch process chamberPedestal replacement or refurbishment
How it works
A chamber or wafer-processing hardware component used around the wafer, chamber wall, source area, or electrostatic chuck stack.
Geometry, material, coating, and wafer size strongly affect process fit, plasma exposure, and contamination control.
Technical guide
ceramic_or_metal
Many chamber parts use ceramics, aluminum, stainless steel, quartz, or coated metals depending on plasma and chemistry exposure.
ESC
Electrostatic chuck hardware clamps or supports wafers during processing.
What to verify before purchase
- Confirm exact pedestal revision and insert configuration.
- Verify 200 mm etch chamber compatibility and surface condition.
Confirm with the seller
- Exact machine compatibility beyond the named platform/context is not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.