Product description
Applied Materials 0010-11228 300 mm Endura / PVD magnet assembly, associated with MD and LP-3.7.3 wording.
Specifications and identifiers
identification
| Description | Magnet assembly, 300 mm Endura |
|---|
| Reported variant | MD / LP-3.7.3 wording appears in evidence |
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| Use context | PVD magnet assembly |
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Equipment context
- Applied Materials Endura 300 mm PVD platform
Applications
PVD/CVD process chambersESC and pedestal stacksgas distribution and chamber shielding hardwareEndura PVD magnet assembly replacement300 mm chamber magnetic field hardwareSputter source/chamber service
How it works
A process-facing chamber component used around the wafer, gas path, lift mechanism, or chamber wall.
Fit, material, surface condition, and cleanliness affect particle control, sealing, plasma behavior, and process uniformity.
What to verify before purchase
- Verify exact revision and magnet variant
- Check for damage, corrosion, or missing hardware
- Confirm chamber/source compatibility
Confirm with the seller
- Exact source/cathode compatibility is not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.