Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.Applied Materials AMAT 0010-12434 RF Match 300mm w/ 03403 Gasline Isolator Assy.
Image 1 of 13

APPLIED MATERIALS 0010-12434

300 mm RF Match with Gasline Isolator Assembly

Market Availability & Pricing

Part number0010-12434
ManufacturerAPPLIED MATERIALS
Current availabilitySee listings below
Latest completed listing with reported salesNo qualifying listing found
Electrical › RF Power › RF Matching Networks
300 mm RF Match with Gasline Isolator Assembly
APPLIED MATERIALS0010-12434RF match assembly
Product description
Applied Materials 0010-12434 RF match for 300 mm configuration with 03403 gasline isolator assembly context.
Specifications and identifiers
identification
Component typeRF match
RF matching assembly for plasma power delivery.
Application size300 mm
Wafer/tool size context associated with the assembly.
Associated assembly03403 gasline isolator assembly
Associated assembly context for the RF match.
Applications
RF plasma chambers300 mm process modulesgasline isolator related RF hardware300 mm RF match networkplasma chamber power matching
How it works

An RF match adjusts impedance between an RF generator and a plasma load.

Correct match network, frequency, power rating, and chamber configuration are critical for plasma stability and equipment protection.

Technical guide
RF
Radio frequency power is used to sustain plasma in many semiconductor processes.
What to verify before purchase
  • Confirm frequency, power rating, chamber position, and whether the gasline isolator is included or only associated.
Confirm with the seller
  • Frequency, power rating, and specific platform are not confirmed.

Product reference only. Confirm fitment, revision, included components, and specifications before purchase.

Documentation

No public documents were listed for this part when captured.

Available Listings

Prices and availability may change. Confirm details with the seller.

No available listings found for this search.

Direct marketplace listings

0 matching listings.

No active-status direct listings are shown on this page.

Marketplace search uses listing titles and service keywords, with quoted phrases and -excluded terms.