Applied Materials 0010-13602 ASSY, HIGH EFFICIENCY RF MATCH - BIA AMATApplied Materials Endura 0010-13602 PVD Wafer Bias High Eff RF MatchAMAT PVD RF MATCH / 0010-13602AMAT PVD RF MATCH / 0010-13602AMAT Applied Materials 0010-13602 RF Match PVD High EFF Rev. P2 Used WorkingRF Match PVD High EFF 0010-13602 Rev. 4 AMAT UsedAMAT Applied Materials 0010-13602 RF Match PVD High EFF Rev. E4 Used WorkingApplied Materials AMAT Endura HGH EFF RF Match for PVD Chamber p/n: 0010-13602Applied Materials AMAT Endura HGH EFF RF Match for PVD Chamber p/n: 0010-13602Applied Materials AMAT Endura HGH EFF RF Match for PVD Chamber p/n: 0010-13602Applied Materials AMAT Endura HGH EFF RF Match for PVD Chamber p/n: 0010-13602Applied Materials AMAT Endura HGH EFF RF Match for PVD Chamber p/n: 0010-13602Applied Materials AMAT Endura HGH EFF RF Match for PVD Chamber p/n: 0010-13602Applied Materials AMAT Endura HGH EFF RF Match for PVD Chamber p/n: 0010-13602
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APPLIED MATERIALS 0010-13602

High-efficiency PVD RF match assembly

Market Availability & Pricing

Part number0010-13602
ManufacturerAPPLIED MATERIALS
Current availabilitySee listings below
Latest completed listing with reported sales1499.95 (currency not captured) — public listing price; reported sold quantity is not a verified transaction
Electrical › RF Power › RF Match Networks
High-efficiency PVD RF match assembly
APPLIED MATERIALS0010-13602RF match assembly
Product description
High-efficiency RF match assembly for PVD wafer-bias application; Endura/PVD context indicated.
Specifications and identifiers
function
FunctionHigh-efficiency RF match
RF impedance-matching assembly for plasma power delivery.
ApplicationPVD wafer bias
Bias RF match context indicated.
Applications
PVD chamberswafer-bias RF systemsEndura RF subsystemsPVD RF bias match replacementRF power subsystem serviceEndura chamber maintenance
How it works

An RF matching network used to match generator output impedance to a plasma load.

A correct RF match is essential for stable plasma power delivery and repeatable PVD processing.

Technical guide
RF match

Impedance-matching network between RF generator and plasma chamber.

wafer bias

RF power applied to influence ion energy at the wafer.

AMAT
Common abbreviation for Applied Materials.
ASSY
Assembly.
BIA
Bias or bias-related descriptor in the evidence.
PCB
Printed circuit board.
PWB
Printed wiring board; often used interchangeably with PCB.
REV
Revision level; confirm against the required tool configuration.
What to verify before purchase
  • Confirm revision and RF power/frequency requirements.
  • Verify connector/flange layout and chamber compatibility.
Confirm with the seller
  • Exact frequency and power rating are not confirmed from provided evidence.

Product reference only. Confirm fitment, revision, included components, and specifications before purchase.

Documentation

No public documents were listed for this part when captured.

Available Listings

Prices and availability may change. Confirm details with the seller.

Applied Materials 0010-13602 ASSY, HIGH EFFICIENCY RF MATCH - BIA AMAT

Applied Materials 0010-13602 ASSY, HIGH EFFICIENCY RF MATCH - BIA AMAT

USD 10000.0000

Observed public listing price, not an accepted sale amount.

Observed active at check time
KR
Condition: Used
Listed: Sep 21, 2023 06:30 UTC
End recorded: Dec 6, 2024 23:58 UTC
Estimated remaining at check: 1
Estimated sold at check: 0

eBay response captured — Checked Oct 3, 2026 16:09 UTC

Availability has not been rechecked; current availability is unknown.

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