Product description
300 mm MCA SNNF low-temperature electrostatic chuck/heater assembly for Applied Materials PVD chamber context.
Specifications and identifiers
identification
| Normalized item type | 300 mm low-temperature ESC assembly |
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key attributes
| Size/context | 300 mm |
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| Function | Low-temperature ESC / e-chuck heater |
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| Possible chamber context | Endura PVD chamber mentioned in several titles |
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Equipment context
- Applied Materials Endura 300 mm PVD chamber
Applications
PVD chamberswafer clamping and heatingtemperature-controlled process moduleswafer clampingwafer temperature controlPVD process chamber hardware
How it works
An electrostatic chuck or heated chuck assembly holds and thermally manages a wafer during processing.
ESCs are high-value process-facing parts where wafer size, clamping type, heater configuration, cooling path, surface condition, and revision all matter.
Technical guide
Kovar
A nickel-cobalt ferrous alloy sometimes used where controlled thermal expansion is needed.
- ESC
- Electrostatic chuck.
What to verify before purchase
- Confirm ESC surface condition, heater function, Kovar/seal details, voltage and cooling interfaces, and revision suffix.
Confirm with the seller
- Exact Endura configuration and 0010-23677-002 suffix applicability are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.