Applied Materials 0010-30687 HIGH EFFICIENCY RF MATCH,ETCH, MXP AMAT (C)AMAT 0010-30687 High Efficiency RF Match 13.56MHz MXP Etch ChamberApplied Materials 0010-30687 High Efficiency RF Match 13.56MHz MXP Etch ChamberAPPLIED MATERIALS 0010-30687 HIGH EFFICENCY RF MATCH 13.56MHZAMAT 0010-30687 H.E. RF MATCHAMAT 0010-30687 High Efficiency RF Match Module MXP, Etch Chamber 401213AMAT 0010-30687 HIGH EFFICIENCY RF MATCH,ETCH, MXPAMAT Applied Materials 0010-30687 High Efficiency RF Auto Match Assembly UsedAMAT 0010-30687 High Efficiency RF Match Module MXPAMAT 0010-30687 RF Match Module MFC. MXP, Etch 471-8W 401213Applied Materials 0010-30687 RF Match, Assy. H.E. (USED) AMATAMAT Applied Materials 0010-30687 RF Match H.E. MXP Etch Used WorkingApplied Materials 0010-30687 RF Match, Assy. H.E. (USED) AMAT
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APPLIED MATERIALS 0010-30687

High-Efficiency RF Match Module

Market Availability & Pricing

Part number0010-30687
ManufacturerAPPLIED MATERIALS
Current availabilitySee listings below
Latest completed listing with reported sales12000 (currency not captured) — public listing price; reported sold quantity is not a verified transaction
Electrical › RF Power › RF Matching Networks
High-Efficiency RF Match Module
APPLIED MATERIALS0010-30687RF match module
Product description
High-efficiency RF match module / RF auto-match assembly for Applied Materials MXP etch chamber use, with 13.56 MHz identified.
Specifications and identifiers
identification
FunctionHigh-efficiency RF match
RF impedance matching assembly used between an RF generator and plasma chamber.
Identified applicationMXP etch
Identified etch chamber context.
reported specs
Frequency13.56 MHz identified
Common plasma RF frequency; verify on the nameplate.
Applications
plasma etch chambersPVD/CVD plasma systemsRF generator-to-chamber matchingplasma etch RF matchingRF generator-to-chamber impedance matchingMXP etch chamber RF subsystem
How it works

An RF match network or RF match control component used to couple RF power efficiently into a plasma load.

Frequency, power rating, impedance range, connector layout, and chamber-specific tuning requirements are critical for plasma process stability.

Technical guide
rf_power

RF power systems often use generators, matching networks, and interlocks to stabilize energy delivery to a chamber.

RF
Radio frequency; in plasma tools this commonly refers to power used to generate or bias plasma.
What to verify before purchase
  • Frequency and power rating
  • Match-network revision
  • Connector and cooling configuration
  • Target chamber compatibility
Confirm with the seller
  • Full tuning range
  • Power rating

Product reference only. Confirm fitment, revision, included components, and specifications before purchase.

Documentation

No public documents were listed for this part when captured.

Available Listings

Prices and availability may change. Confirm details with the seller.

Applied Materials 0010-30687 HIGH EFFICIENCY RF MATCH,ETCH, MXP AMAT (C)

Applied Materials 0010-30687 HIGH EFFICIENCY RF MATCH,ETCH, MXP AMAT (C)

USD 11000.0000

Observed public listing price, not an accepted sale amount.

Observed active at check time
KR
Condition: Used
Listed: Jun 5, 2026 00:24 UTC
Estimated remaining at check: 1
Estimated sold at check: 0

eBay response captured — Checked Oct 15, 2026 16:32 UTC

Availability has not been rechecked; current availability is unknown.

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