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APPLIED MATERIALS 0010-34895

Vectra IMP Source RF Match

Market Availability & Pricing

Part number0010-34895
ManufacturerAPPLIED MATERIALS
Current availabilitySee listings below
Latest completed listing with reported sales1958.99 (currency not captured) — public listing price; reported sold quantity is not a verified transaction
Electrical › RF Power › RF Matching Networks
Vectra IMP Source RF Match
APPLIED MATERIALS0010-34895RF match assembly
Product description
Applied Materials 0010-34895 RF match assembly for Vectra IMP source / 300 mm Endura context.
Specifications and identifiers
identification
FunctionRF match
Reported contextVectra IMP source, 300 mm Endura
Applications
etch and PVD plasma toolssource and bias RF circuitsLam TCP/DSQ and Applied Materials RF power systemsVectra IMP source RF matchingEndura PVD plasma power serviceRF match replacement
How it works

An RF matching network used between an RF generator and a plasma load.

Proper impedance matching reduces reflected power and helps maintain stable plasma operation.

Technical guide
RF matching

capacitor/inductor network for impedance transformation

RF
radio frequency power used for plasma generation
What to verify before purchase
  • Verify frequency, power rating, and tune components
  • Confirm Endura/Vectra source compatibility
  • Check cooling and interlock interfaces
Confirm with the seller
  • Exact RF match revision is not confirmed

Product reference only. Confirm fitment, revision, included components, and specifications before purchase.

Documentation

No public documents were listed for this part when captured.

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