Product description
Dual gas feed block for HDP-CVD hardware.
Specifications and identifiers
supported identity
| Function | Dual gas feed Routes or distributes two gas feed paths. |
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| Process context | HDP-CVD High-density plasma CVD context appears repeatedly. |
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| Item type | Block Mechanical/gas distribution block component. |
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Applications
process chambersPVD/CVD/etch hardwarewafer-edge controlgas distribution or chamber shieldingHDP-CVD gas distributionDual gas feed hardware
How it works
A process-chamber mechanical or consumable component shaped for a specific wafer size, chamber location, or process module.
Geometry, material, coating, cleanliness, and wafer-size compatibility can directly affect plasma behavior, particle control, and fit.
Technical guide
possible
ceramic, quartz, silicon, aluminum, stainless steel, titanium, or coated metals may be used depending on the specific component; only listed materials should be treated as confirmed
- CVD
- chemical vapor deposition
- ESC
- electrostatic chuck
- HDP-CVD
- high-density plasma chemical vapor deposition
- PVD
- physical vapor deposition
What to verify before purchase
- Verify port pattern, material, surface condition, and exact chamber fit.
Confirm with the seller
- Exact tool configuration and revision compatibility are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.