Product description
Cover, insulator source, approximately 11.30 in., for Applied Materials PVD/source-area hardware
Specifications and identifiers
supported identity
| item noun | Cover, insulator source A cover/insulator component associated with a source area. |
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| dimension callout | 11.30 in. Dimension wording is repeated in provided titles but should be verified from the part itself. |
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| process context | PVD/source area Context appears in provided wording but exact chamber/tool fit is not confirmed. |
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Equipment context
- Applied Materials PVD source/chamber hardware
Applications
PVD/CVD chamber kitsplasma chamber shieldingwafer-edge or source-area protectionSource-area insulation or shielding in a PVD chamberReplacement chamber cover/insulator hardware
How it works
A chamber ring, shield, insert, or cover ring is a process-area component used around the wafer or chamber opening.
Geometry, coating, material, and wafer size affect process uniformity, particle control, and fit.
Technical guide
ceramic_or_metal
Exact material or coating should be verified; many chamber rings are ceramic, aluminum, titanium, or coated metal depending on process.
process kit
Replaceable chamber hardware exposed to process gases or plasma.
- CVD
- chemical vapor deposition
- ESC
- electrostatic chuck
- PVD
- physical vapor deposition
What to verify before purchase
- Confirm diameter/geometry and mounting features
- Verify ceramic/insulator material and whether the 11.30 in. callout is exact
- Confirm tool/chamber compatibility
Confirm with the seller
- Exact material
- Exact Applied Materials platform
- Condition or cleaning status
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.