Product description
Applied Materials 0020-20512 top RF heater shield / shield heater RF top.
Specifications and identifiers
identification
| Description | Shield heater RF top / RF top heater shield |
|---|
| Reported revision | Rev H appears in one title; verify label |
|---|
Applications
PVD/CVD/etch chamber kitswafer-area consumablesESC and focus-ring stacksRF top shield replacementHeater/chamber shield serviceProcess chamber mechanical maintenance
How it works
A shaped process-facing ring or chamber component used near a wafer, chuck, electrode, or gas path.
Geometry, material, coating, and cleanliness can affect plasma behavior, contamination risk, and fit.
Technical guide
aluminum
common lightweight chamber hardware material
ceramic
electrically insulating, process-compatible material used in chamber hardware
quartz
high-purity silica glass used in plasma or high-temperature environments
- ESC
- electrostatic chuck
What to verify before purchase
- Verify revision and exact chamber location
- Inspect for wear, arcing, deposits, and warping
- Confirm material/coating requirements
Confirm with the seller
- Exact chamber and material are not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.