Product description
8 inch clamp ring for SNNF/R/E exclusion use, with Ti/titanium wording in multiple source descriptions.
Specifications and identifiers
chamber hardware
| Size | 8 inch Nominal wafer/chamber size context. |
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| Item noun | Clamp ring Ring used to clamp or retain chamber/process hardware. |
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| Process wording | SNNF, Ti, R/E exclusion Application/material wording repeated in evidence; exact process context should be verified. |
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Applications
etch and deposition process chambersESC and cathode surrounding hardwareconsumable chamber hardware replacementPVD/etch chamber clamp-ring replacementedge-exclusion or shield retention hardware
How it works
A chamber ring is a shaped process-area component used around wafers, electrodes, shields, or chamber openings.
Rings influence plasma confinement, edge exclusion, process uniformity, and protection of more expensive chamber hardware.
Technical guide
Vespel
High-performance polyimide used in some confinement or insulating ring applications.
quartz
High-purity ceramic material often used where thermal and plasma compatibility are important.
tantalum/titanium
Metals used in PVD-related chamber hardware when process compatibility requires them.
What to verify before purchase
- Verify titanium material, exact SNNF/R/E exclusion configuration, and revision.
- Confirm cleaned/refurbished condition before reuse.
Confirm with the seller
- Exact tool configuration and compatibility are not confirmed beyond the part identity.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.