Product description
Applied Materials 0020-26820 8 inch aluminum clamp ring, with SNNF/SHUNT context and 6-pad +/-0.5 mm wording in the evidence.
Specifications and identifiers
identification
| Description | 8 inch clamp ring |
|---|
| Material | Aluminum reported |
|---|
| Reported variants/context | SNNF, SHUNT, and 6 pads +/-0.5 mm appear in evidence |
|---|
| Platform context | 5500 PVD appears in evidence |
|---|
Applications
PVD/CVD/etch chamber kitswafer-area consumablesESC/focus/shadow ring stacksPVD chamber clamp ring serviceWafer/chamber clamping hardware8 inch process kit replacement
How it works
A ring-shaped process or mechanical component used around a wafer, chuck, chamber opening, or plasma region.
Ring geometry, material, coating, and cleanliness directly affect fit, plasma behavior, and process contamination.
Technical guide
aluminum
common chamber hardware material
ceramic
electrically insulating process-compatible material
quartz
high-purity silica glass used in process chambers
- SNNF
- process/tool context abbreviation seen in the evidence; verify exact meaning for the tool
What to verify before purchase
- Verify exact variant: SNNF vs SHUNT wording
- Confirm dimensions, pad count, coating, and revision
- Inspect for wear, arcing, erosion, and contamination
Confirm with the seller
- Exact variant and tool revision are not fully resolved
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.