Product description
Applied Materials 0020-27309 8 inch titanium cover ring, with “TI 101%” wording in the evidence.
Specifications and identifiers
identification
| Description | Cover ring |
|---|
| Nominal size | 8 inch / 200 mm class |
|---|
| Material wording | TI / titanium appears in evidence |
|---|
Applications
PVD and etch chamber kitsESC/focus-ring stacksCMP retaining hardwarePVD chamber cover ring replacement8 inch process-facing ring serviceChamber consumable replacement
How it works
A process-facing ring used around a wafer, chuck, electrode, or chamber opening.
Ring geometry, material, coating, and cleanliness can affect fit, plasma behavior, and contamination risk.
Technical guide
alumina
ceramic material used for high-temperature/electrical insulation
quartz
plasma-compatible silica glass used in process-facing parts
titanium
metal used in some PVD chamber consumables
- 200 mm / 8 inch
- wafer-size class or nominal ring size
What to verify before purchase
- Verify material grade and coating/cleanliness
- Confirm revision and dimensions
- Inspect erosion and surface condition
Confirm with the seller
- Exact process chamber is not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.