Product description
Applied Materials 0020-28989 8 inch PVD lower shield, associated with 101 G2/G3 shutter context and 06-08245-00 cross-reference.
Specifications and identifiers
identification
| Description | PVD lower shield |
|---|
| Nominal size | 8 inch / 200 mm class |
|---|
| Context | 101 G2/G3 shutter wording; 06-08245-00 appears as related reference |
|---|
Applications
PVD/CVD chamber kitsESC and cathode stacksprocess chamber liner and shield replacementPVD lower shield replacement8 inch chamber shield kit serviceShutter-adjacent process shield replacement
How it works
A process-facing ring, liner, shield, or ceramic/quartz chamber component used around the wafer or chamber opening.
Geometry, material, surface condition, and cleanliness affect process uniformity, plasma behavior, particle risk, and fit.
Technical guide
alumina
ceramic material used where electrical insulation and plasma compatibility are needed
aluminum
common chamber hardware material when compatible with the process
quartz
high-purity silica glass used for plasma-facing or high-temperature parts
- ESC
- electrostatic chuck
- PVD
- physical vapor deposition
What to verify before purchase
- Verify G2/G3 shutter compatibility
- Inspect for coating, erosion, and deformation
- Confirm exact revision and cross-reference
Confirm with the seller
- Exact tool/chamber compatibility is not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.