Product description
Vespel cap used with electrostatic chuck hardware.
Specifications and identifiers
component identification
| Component | Cap |
|---|
| Material | Vespel indicated |
|---|
| Associated hardware | ESC indicated |
|---|
Applications
process chamber rebuildsESC and pedestal protectionplasma-facing hardwarePVD/CVD chamber maintenanceESC hardware replacementinsulating or wear cap replacementprocess chamber service
How it works
A chamber-facing ceramic, sapphire, or insulating process component.
Chamber parts can affect plasma exposure, particle control, thermal behavior, and fit around wafer or electrode hardware.
Technical guide
ceramic_or_sapphire
Ceramic and sapphire are used where electrical insulation, plasma resistance, optical transmission, or thermal stability are needed.
- ESC
- Electrostatic chuck, a wafer-holding component used in many plasma process tools.
What to verify before purchase
- Confirm cap dimensions and installed location.
- Verify Vespel grade and ESC compatibility.
Confirm with the seller
- Exact Vespel grade and dimensions are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.