Product description
Protection cover for a 200 mm electrostatic chuck assembly.
Specifications and identifiers
esc component
| Component | Protection cover / electrostatic chuck cover |
|---|
| Nominal wafer size | 200 mm |
|---|
| Revision | Rev A appears in several evidence entries |
|---|
Applications
process chamber rebuildsESC and pedestal protectionplasma-facing hardwarePVD/CVD chamber maintenanceESC protectionprocess chamber maintenancewafer chuck hardware replacement
How it works
A chamber-facing ceramic, sapphire, or insulating process component.
Chamber parts can affect plasma exposure, particle control, thermal behavior, and fit around wafer or electrode hardware.
Technical guide
ceramic_or_sapphire
Ceramic and sapphire are used where electrical insulation, plasma resistance, optical transmission, or thermal stability are needed.
- ESC
- Electrostatic chuck, a wafer-holding component used in many plasma process tools.
What to verify before purchase
- Confirm Rev A if required.
- Check material, coating, and fit against the installed ESC.
Confirm with the seller
- Exact material and ESC model are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.