Product description
Plate / pumping ring, 8 inch / 200 mm FC, WXZ
Specifications and identifiers
identification
| Component | Pumping plate / pumping ring |
|---|
| Size | 8 in / 200 mm |
|---|
| Tool/process context | FC, WXZ referenced |
|---|
Applications
Process chambersWafer processing hardwareVacuum chamber servicePreventive maintenance kitsChamber pumping geometry componentWXZ/FC chamber hardware replacement
How it works
A mechanical process-tool component used for shielding, spacing, sealing, mounting, confinement, or chamber geometry control.
Material, coating, dimensions, process position, and surface condition can affect plasma behavior, contamination risk, and mechanical fit.
Technical guide
- CVD
- Chemical vapor deposition.
- ESC
- Electrostatic chuck.
- QTZ
- Quartz.
- SST
- Stainless steel.
What to verify before purchase
- Plate vs. ring terminology for local inventory
- Dimensions and surface condition
- Exact WXZ chamber compatibility
Confirm with the seller
- Specific tool serial-number compatibility
- Current calibration or functional test status
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.