Product description
Plasma screen, Y2O3-coated, 300 mm DPS II / poly etch context.
Specifications and identifiers
Function
| Likely role | Process screen/shield in a plasma chamber |
|---|
Identity
| Supported item noun | Plasma screen |
|---|
| Coating/material context | Y2O3-coated |
|---|
| Size/platform context | 300 mm DPS II |
|---|
Applications
PVD/CVD/etch process chamberschamber rebuildsconsumable kitstool refurbishmentplasma chamber shieldingDPS II process kit servicepoly etch chamber maintenance
How it works
A mechanical chamber or process-area component used near the wafer, plasma, gas flow, or vacuum boundary of a semiconductor tool.
Geometry, coating, material, and revision can affect process uniformity, particle control, sealing, and compatibility with nearby assemblies.
What to verify before purchase
- Confirm Y2O3 coating condition and revision
- Check whether repaired/cleaned status affects usability
Confirm with the seller
- Exact coating thickness and base material
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.