Product description
Deposition ring, flanged, aluminum arc-sprayed, 300 mm context indicated in several descriptions.
Specifications and identifiers
Function
| Likely role | Process ring used around the wafer or chamber deposition area |
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Identity
| Supported item noun | Deposition ring |
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| Geometry | Flanged ring |
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| Material/coating context | Aluminum, arc-sprayed |
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| Size context | 300 mm |
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Applications
PVD/CVD/etch process chamberschamber rebuildsconsumable kitstool refurbishmentPVD/CVD deposition-area shieldingprocess kit replacementparticle and deposition management
How it works
A mechanical chamber or process-area component used near the wafer, plasma, gas flow, or vacuum boundary of a semiconductor tool.
Geometry, coating, material, and revision can affect process uniformity, particle control, sealing, and compatibility with nearby assemblies.
What to verify before purchase
- Confirm 300 mm size and revision
- Verify coating condition and whether the ring is refurbished or new
Confirm with the seller
- Exact chamber/platform compatibility
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.