Product description
Ring, separation, MXP+ liner / cathode liner for MXP etch chamber context, Applied Materials 0021-09098.
Specifications and identifiers
identification
| Supported description | Ring separation MXP+ liner / cathode liner Repeated evidence wording |
|---|
| Process context | MXP etch chamber Chamber/platform context from evidence |
|---|
| Related wording | Ring separator MXP liner Variant wording used for the same part |
|---|
Equipment context
- MXP / MXP+ etch chamber context
Applications
etch chambersCVD chamberswafer pedestalschamber linersEtch chamber ring/liner replacementCathode liner or separation-ring service
How it works
A process ring or chamber ring is a shaped consumable or fixture used around the wafer/process region.
Ring geometry and material affect plasma confinement, spacing, particle performance, and process repeatability.
Technical guide
aluminum
Lightweight metal often anodized or coated for chamber use.
quartz
High-purity fused silica often used for plasma/thermal compatibility.
- AL
- aluminum
- ID
- inside diameter
- OD
- outside diameter
- QTZ
- quartz
What to verify before purchase
- Verify exact MXP/MXP+ chamber version and ring geometry.
- Inspect material, coating, and cleanliness class.
Confirm with the seller
- Exact material and whether it is a cathode liner versus adjacent separation ring function are not independently confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.