Product description
Vespel inner cover, 8 inch, stepped with notch, for Applied Materials chamber hardware.
Specifications and identifiers
physical
| Material | Vespel |
|---|
| Component type | Inner cover |
|---|
| Size | 8 inch |
|---|
| Profile/features | Stepped, notch |
|---|
Applications
PVD chamber kitsEtch chamber kitsCVD process hardwareESC-adjacent ringsInner chamber cover replacementHigh-temperature polymer chamber hardware
How it works
A ring, cover, focus ring, clamp ring, or shield sits around the wafer/process area to control plasma exposure, deposition, containment, or mechanical alignment.
Small differences in profile, wafer size, material, and revision can affect process uniformity and chamber compatibility.
Technical guide
Vespel
Polyimide material used for heat-resistant, low-wear parts.
ceramic
Hard, insulating, plasma-resistant material used in some chamber rings and shields.
poly
Polymer material context from the provided evidence; verify exact material grade.
- clamp_ring
- A ring used to hold, locate, or clamp process hardware or wafer-related components.
- focus_ring
- A ring near the wafer edge that helps shape plasma or process conditions.
What to verify before purchase
- Verify Vespel grade, dimensions, notch orientation, and tool chamber compatibility.
- Inspect for heat damage, wear, or contamination.
Confirm with the seller
- Exact chamber model and revision are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.