Product description
Upper liftable short PVD shield for Applied Materials equipment; cobalt context appears in one source.
Specifications and identifiers
physical
| Component type | Upper shield |
|---|
| Configuration | Liftable short |
|---|
| Process context | PVD |
|---|
process variant
| Cobalt context | Referenced in one source Verify whether this applies to the specific target installation. |
|---|
revision context
| Revisions referenced | Rev 005 / Rev 009 |
|---|
Applications
PVD chamber kitsEtch chamber kitsCVD process hardwareESC-adjacent ringsPVD upper shield replacementLiftable shield/chamber kit hardware
How it works
A ring, cover, focus ring, clamp ring, or shield sits around the wafer/process area to control plasma exposure, deposition, containment, or mechanical alignment.
Small differences in profile, wafer size, material, and revision can affect process uniformity and chamber compatibility.
Technical guide
Vespel
Polyimide material used for heat-resistant, low-wear parts.
ceramic
Hard, insulating, plasma-resistant material used in some chamber rings and shields.
poly
Polymer material context from the provided evidence; verify exact material grade.
- clamp_ring
- A ring used to hold, locate, or clamp process hardware or wafer-related components.
- focus_ring
- A ring near the wafer edge that helps shape plasma or process conditions.
What to verify before purchase
- Verify revision, shield profile, process/material variant, cleaned condition, and chamber compatibility.
- Confirm whether cobalt context is required for the application.
Confirm with the seller
- Exact material/coating and chamber version are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.