Product description
Applied Materials 0021-24184 bottom side 2 liner for 300 mm SE context.
Specifications and identifiers
identification
| Description | Liner, bottom side 2 |
|---|
| Nominal size | 300 mm |
|---|
| Context | SE wording appears |
|---|
Applications
PVD/CVD chamber kitsESC/focus-ring stackswafer-area consumables300 mm chamber liner replacementProcess chamber shieldingBottom-side liner service
How it works
A shaped ring, plate, shield, or liner used around the wafer or chamber process area.
Geometry, material, coating, and cleanliness affect plasma behavior, sealing, contamination risk, and fit.
Technical guide
aluminum
common chamber hardware material
quartz
plasma-compatible ceramic glass used in high-temperature or plasma-exposed parts
stainless steel
metal used where durability and chemical resistance are needed
- 200 mm
- wafer-size class or nominal chamber component size
- 300 mm
- wafer-size class or nominal chamber component size
What to verify before purchase
- Verify liner side/location and revision
- Inspect coating, erosion, and deposits
- Confirm chamber family and process compatibility
Confirm with the seller
- Exact chamber model and material/coating are not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.