Product description
Applied Materials 0021-34728 300 mm SiCoNi blocker plate with ENP pattern wording.
Specifications and identifiers
identification
| Description | Blocker plate |
|---|
| Process/context | SiCoNi |
|---|
| Nominal size | 300 mm |
|---|
| Pattern note | ENP pattern wording appears |
|---|
Applications
PVD/CVD chamber kitsESC/focus-ring stackswafer-area consumablesGas or process distribution blocking/shaping300 mm SiCoNi chamber hardwareProcess-facing plate replacement
How it works
A shaped ring, plate, shield, or liner used around the wafer or chamber process area.
Geometry, material, coating, and cleanliness affect plasma behavior, sealing, contamination risk, and fit.
Technical guide
aluminum
common chamber hardware material
quartz
plasma-compatible ceramic glass used in high-temperature or plasma-exposed parts
stainless steel
metal used where durability and chemical resistance are needed
- 200 mm
- wafer-size class or nominal chamber component size
- 300 mm
- wafer-size class or nominal chamber component size
What to verify before purchase
- Verify pattern, material, and coating
- Confirm chamber and revision
- Inspect for deposits, warping, and surface damage
Confirm with the seller
- Exact material and pattern interpretation are not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.