Product description
Pedestal/deposition ring for 300 mm Advanced 101 Applied Materials chamber hardware.
Specifications and identifiers
identification
| Ring type | Pedestal / deposition ring Ring-shaped chamber component associated with a pedestal or deposition position. |
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| Size context | 300 mm Wafer/tool size context for the part. |
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| Configuration reference | Advanced 101 / ADV 101 Configuration or chamber family wording to verify against tool documentation. |
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Applications
PVD chambersCVD chambersplasma processing chamberswafer support or shielding assemblies300 mm deposition chamber hardwarepedestal-area ring replacementprocess chamber maintenance
How it works
A ring-shaped mechanical component used in or around a semiconductor process chamber.
Chamber rings help define plasma, gas flow, shielding, spacing, or wafer-area geometry; using the wrong ring can affect process uniformity and mechanical fit.
Technical guide
ceramic
Ceramic versions are commonly used where electrical insulation, thermal stability, or plasma resistance is needed.
process chamber hardware
Chamber hardware is usually tool- and revision-specific and should be matched carefully by part number and revision.
What to verify before purchase
- Confirm whether the required item is a pedestal ring, deposition ring, or both terms for the same part.
- Verify revision and chamber configuration.
Confirm with the seller
- Exact material and compatible chamber model are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.