Product description
ESC / electrostatic chuck pedestal shell assembly, 200mm notch, associated with poly etch and HV chamber service.
Specifications and identifiers
identification
| Wafer size | 200 mm Supported by repeated 200mm descriptions. |
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| Orientation feature | notch Indicates wafer/chuck orientation feature. |
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| Function | ESC pedestal / shell assembly Supports or forms part of an electrostatic chuck/pedestal assembly. |
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Applications
etch chamberspoly etch modules200 mm wafer processing200mm electrostatic chuck/pedestal servicepoly etch chamber hardware
How it works
A pedestal or electrostatic chuck related chamber assembly used to hold or bias a wafer during processing.
Pedestals and ESC assemblies directly affect wafer clamping, thermal transfer, RF coupling, and process uniformity.
Technical guide
RF_bias
Some pedestal assemblies route or couple RF power for biasing the wafer.
electrostatic_chuck
An ESC uses electrostatic force to hold a wafer during plasma processing.
- HV
- High voltage; verify insulation and connector condition before reuse.
- notch
- A wafer-orientation feature or matching chamber feature for aligned 200 mm wafers.
What to verify before purchase
- Confirm exact assembly relationship to 0010-10528, 0020-32963, or other associated subassemblies.
- Verify high-voltage insulation and backside/heater interfaces before installation.
Confirm with the seller
- Exact chamber model and revision are not confirmed from the available part references.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.