Product description
Faceplate, dual gas, 200 mm, TiCl4/TiN process context
Specifications and identifiers
identification
| Item type | Faceplate Gas distribution or process faceplate. |
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| Gas/process context | Dual gas, TiCl4/TiN Process chemistry/context stated in evidence. |
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| Wafer size/context | 200 mm Size context from evidence. |
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Applications
CVD/PVD process chambersdual-gas delivery zonesprocess kit hardwareDual-gas process faceplate replacement200 mm chamber gas distribution
How it works
A chamber faceplate that helps distribute process gas into a reaction zone.
Faceplates strongly affect gas uniformity, deposition/etch profile, and contamination control, so exact match is important.
Technical guide
metal/ceramic
Exact material not confirmed; verify with drawing or nameplate.
TiCl4/TiN
Titanium tetrachloride/titanium nitride process context in semiconductor processing.
What to verify before purchase
- Verify material, hole pattern, revision, cleaning status, and exact chamber compatibility.
Confirm with the seller
- Exact base material and chamber platform are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.