Product description
Fixed restraint clip, silicon-sprayed, 200 mm context, for Applied Materials
Specifications and identifiers
supported identity
| item noun | Fixed restraint clip Clip/restraint component for process hardware. |
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| surface treatment | Silicon-sprayed Repeated coating/surface callout. |
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| size context | 200 mm Repeated wafer/chamber size context. |
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Applications
PVD/CVD chamber kitsplasma chamber shieldingwafer-edge or source-area protectionProcess-kit clip or restraint hardware200 mm chamber component retention
How it works
A chamber ring, shield, insert, or cover ring is a process-area component used around the wafer or chamber opening.
Geometry, coating, material, and wafer size affect process uniformity, particle control, and fit.
Technical guide
ceramic_or_metal
Exact material or coating should be verified; many chamber rings are ceramic, aluminum, titanium, or coated metal depending on process.
process kit
Replaceable chamber hardware exposed to process gases or plasma.
- CVD
- chemical vapor deposition
- ESC
- electrostatic chuck
- PVD
- physical vapor deposition
What to verify before purchase
- Verify coating and wear condition
- Confirm exact geometry and 200 mm chamber fit
- Check quantity/set requirements
Confirm with the seller
- Exact substrate material under coating
- Exact process module
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.