Product description
300mm half-ring spacer / CVD lid insulator.
Specifications and identifiers
identification
| Item | Spacer / half ring Mechanical spacer or half-ring component. |
|---|
| Wafer size | 300mm Size context stated in the item description. |
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| Application context | CVD insulator lid Process chamber lid insulation context is referenced in the description. |
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Applications
CVD and HDP-CVD chambersetch process modulesCMP head and wafer support assemblies300mm CVD chamber lid insulation/spacer hardwarehalf-ring process chamber component
How it works
A chamber consumable or process-facing component sits in or near the process environment and influences gas flow, plasma boundary conditions, shielding, or wafer support.
Material, coating, dimensions, and surface condition can affect particles, deposition/etch uniformity, and chamber matching.
Technical guide
- CVD
- Chemical vapor deposition.
- HDP-CVD
- High-density plasma chemical vapor deposition.
- TEOS
- Tetraethyl orthosilicate, a common silicon-oxide precursor.
What to verify before purchase
- Verify material, dimensions, and half-ring orientation.
- Confirm CVD chamber/lid compatibility.
Confirm with the seller
- Exact material and compatible chamber model.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.