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APPLIED MATERIALS 0200-01080

Deposition Ring, PVD Process, 300mm ESC

Market Availability & Pricing

Part number0200-01080
ManufacturerAPPLIED MATERIALS
Current availabilitySee listings below
Latest completed listing with reported salesNo qualifying listing found
Mechanical › Chamber Components › Deposition Rings
Deposition Ring, PVD Process, 300mm ESC
APPLIED MATERIALS0200-01080deposition ring
Product description
Deposition ring for a 300mm PVD process chamber with ESC context.
Specifications and identifiers
supported identity
ComponentDeposition ring
Ring used in the PVD chamber process area.
Process contextPVD process
Physical vapor deposition chamber context.
Wafer size context300mm
Supported by repeated evidence; verify against tool BOM.
ESC contextESC
Electrostatic chuck context appears with the deposition ring.
Equipment context
  • 300mm PVD chamber with ESC
Applications
PVD process chambersESC-based wafer processingprocess kit maintenancePVD chamber process kit serviceESC-adjacent deposition ring replacement
How it works

A chamber ring used around the wafer/process area to manage deposition geometry and protect surrounding chamber hardware.

Correct ring geometry and condition help maintain film uniformity, reduce particle generation, and protect the electrostatic chuck or process kit.

Technical guide
PVD

Physical vapor deposition; a vacuum deposition process where material is sputtered or evaporated onto a wafer.

ESC
Electrostatic chuck; a wafer-holding component that uses electrostatic force.
What to verify before purchase
  • Verify exact part number, revision, condition, and tool fitment before installation.

Product reference only. Confirm fitment, revision, included components, and specifications before purchase.

Documentation

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