Product description
Insulator, 300 mm ceramic source adaptor/source adapter
Specifications and identifiers
supported identity
| Component type | Ceramic insulator / source adaptor Insulating chamber or source-adapter component. |
|---|
| Wafer size context | 300 mm Repeated in the descriptions. |
|---|
Applications
PVD/CVD/etch chamber hardwarewafer-edge process controlshielding or clamping locationssource adaptor insulation300 mm chamber hardwarePVD/process chamber replacement
How it works
A process ring, focus ring, clamp ring, or shield ring is a shaped chamber part used around the wafer or process area.
Geometry and material influence plasma behavior, particle control, wafer edge conditions, and chamber compatibility.
Technical guide
ceramic
Electrical insulation and plasma/thermal resistance are common reasons ceramics appear in chamber rings.
graphite
Graphite can be used in high-temperature or sputter-related fixtures.
quartz
Quartz is used where thermal and plasma compatibility are required.
plasma processing
Rings and shields help define exposed surfaces and protect nearby hardware.
- DPS
- decoupled plasma source
- ESC
- electrostatic chuck
- SNNF
- process/configuration abbreviation; exact expansion not confirmed from provided evidence
What to verify before purchase
- Verify exact revision and source-adaptor geometry.
- Confirm ceramic condition and absence of chips/cracks.
Confirm with the seller
- Exact ceramic composition
- machine compatibility beyond Endura context
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.