Product description
Pumping ring, ceramic C-channel, side 2, for Applied Materials Producer SE / 300 mm chamber context.
Specifications and identifiers
identification
| Supported item noun | Pumping ring |
|---|
| Material | Ceramic |
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| Profile/location | C-channel, side 2 |
|---|
platform context
| Possible platform | Producer SE / 300 mm Repeated in provided evidence; verify exact chamber configuration. |
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Equipment context
- Applied Materials Producer SE 300 mm
Applications
CVD chambersetch chambersdeposition chambersplasma process modulesChamber pumping path componentCeramic chamber hardware replacementProcess chamber flow/conductance hardware
How it works
A chamber component used inside or near a process chamber where shape, cleanliness, thermal behavior, and chemical compatibility matter.
Chamber hardware can affect plasma behavior, pumping conductance, particle generation, and wafer/process uniformity.
Technical guide
ceramic
Ceramic chamber parts are commonly used for insulation, thermal stability, and plasma/process resistance; exact ceramic grade is not confirmed unless explicitly stated.
C-channel
A channel profile can guide flow, pumping, or mechanical location depending on the chamber design.
- side 2
- Tool-specific orientation/location marking that should be matched to the chamber bill of materials.
What to verify before purchase
- Verify side/orientation marking and chamber generation.
- Check for chips, cracks, coating wear, and cleaning history on ceramic parts.
Confirm with the seller
- Exact ceramic grade and complete dimensional drawing are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.