Product description
Applied Materials 0200-09534 clamp ring, described as 200/197 no-flat (“NO FLT”) configuration.
Specifications and identifiers
identification
| Description | Clamp ring |
|---|
| Size/configuration | 200/197 |
|---|
| Feature note | NO FLT / no-flat wording appears in evidence |
|---|
Applications
PVD/CVD chamber consumable stacksESC/focus/shadow/deposition ring setsthrottle valve and gas distribution hardwareClamp ring replacementWafer-area chamber ring stackProcess chamber consumable hardware
How it works
A process-facing ring or plate used around the wafer, chuck, throttle opening, or gas-distribution area inside a semiconductor process chamber.
Geometry, material, coating, cleanliness, and revision affect fit, plasma behavior, gas flow, contamination risk, and process repeatability.
Technical guide
aluminum
Common in chamber hardware; verify coating and cleaned/refurbished status.
ceramic
Often used for plasma-facing insulation and wear resistance when supported by part markings.
quartz
High-purity silica glass used in many plasma or thermal chamber locations.
- ESC
- electrostatic chuck
- SNNF
- process/context abbreviation seen in chamber part descriptions; verify against tool documentation
What to verify before purchase
- Confirm exact dimensions and no-flat configuration
- Verify material, coating, revision, and cleaned/refurbished status
- Check for edge damage, warping, and particle contamination
Confirm with the seller
- Exact tool/chamber compatibility is not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.