Product description
Quartz shield for 200 mm sputter etch chamber use, Applied Materials part 0200-09608.
Specifications and identifiers
physical characteristics
| Material | Quartz Clean chamber material used for plasma/process compatibility. |
|---|
| Size context | 200 mm Wafer/chamber size context from descriptions. |
|---|
| Process context | Sputter etch Named application context. |
|---|
Applications
process chamberswafer supportplasma shieldingchamber rebuildsSputter etch chamber shielding200 mm chamber maintenance
How it works
A chamber hardware component that supports, shields, spaces, clamps, or routes process flow around wafers.
Material, coating, dimensions, revision, and chamber fit are critical for process integrity and contamination control.
What to verify before purchase
- Quartz condition and cleanliness
- Revision suffix such as 0200-09608V
- Exact chamber/tool compatibility
Confirm with the seller
- Exact tool compatibility beyond the named platform/context
- Calibration or working condition
- Revision interchangeability
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.