Product description
Focusing ring, quartz/QTZ, 200 mm, Poly/WSi process context, 230M where applicable
Specifications and identifiers
supported details
| Item type | Focusing ring A chamber ring used around the wafer/process area to help shape plasma or process exposure. |
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| Material | Quartz / QTZ Quartz is used for high-purity, thermally stable chamber components. |
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| Wafer size context | 200 mm Indicates use in a 200 mm process environment. |
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| Process context | Poly/WSi Poly/WSi suggests polysilicon/tungsten silicide process context; verify tool recipe compatibility. |
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| Other marking | 230M Preserved as a supported descriptor; exact significance not independently confirmed. |
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Equipment context
- 200 mm Poly/WSi process chamber context
Applications
plasma process chambers200 mm deposition or etch chamber consumablesPoly/WSi process hardwareplasma/process focusing around wafer areareplacement quartz chamber consumable200 mm Poly/WSi chamber maintenance
How it works
A precision quartz chamber ring used near the wafer/process region.
Focusing rings influence plasma/process uniformity and must match chamber geometry, wafer size, and material requirements.
Technical guide
Quartz
High-purity silica material commonly used for plasma-facing or high-temperature chamber parts.
- Poly/WSi
- Polysilicon / tungsten silicide process context
- QTZ
- Quartz
What to verify before purchase
- Verify dimensions and profile against chamber drawings
- Confirm material grade and cleanliness requirements
- Confirm whether 230M descriptor is required for the application
Confirm with the seller
- Exact chamber model
- Exact process recipe compatibility
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.