Product description
Focus ring, 125 mm, poly/polycide, 135 mm; Applied Materials 0200-09773 / 0200-09773-P1.
Specifications and identifiers
fit notes
| Use area | Wafer-edge/process ring area Focus rings are chamber consumables and geometry-sensitive. |
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supported details
| Item type | Focus ring |
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| Size references | 125 mm and 135 mm Both dimensions appear in the supported description and should be verified against the physical ring. |
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| Material/process wording | Poly/polycide Preserved as process-specific wording; verify actual material specification. |
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| Variant | 0200-09773-P1 Reported variant/suffix for this focus ring. |
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Applications
plasma etch chambersCVD/PVD process chamberselectrostatic chuck assembliesplasma chamber focus ring replacementwafer-edge process hardwareconsumable chamber hardware service
How it works
A chamber ring positioned around or near the wafer area to shape plasma behavior and protect nearby chamber hardware.
Focus and edge rings affect plasma uniformity, wafer-edge conditions, and chamber consumable fit.
Technical guide
poly/polycide
Process-specific material wording should be verified against part markings or OEM documentation before substitution.
ESC
Electrostatic chuck; a chuck that holds the wafer by electrostatic force during processing.
What to verify before purchase
- Exact dimensions
- Material/coating specification
- P1 suffix and revision
- Chamber/tool configuration
Confirm with the seller
- Specific chamber model
- New/used condition
- Interchange with other focus-ring sizes
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.