Product description
Focus ring, 162 mm flat, poly ESC context, for Applied Materials equipment.
Specifications and identifiers
physical
| Component type | Focus ring |
|---|
| Diameter context | 162 mm |
|---|
| Profile | Flat |
|---|
| Material/context | Poly ESC |
|---|
Applications
PVD chamber kitsEtch chamber kitsCVD process hardwareESC-adjacent ringsESC-adjacent focus ring replacementPlasma/process edge control hardware
How it works
A ring, cover, focus ring, clamp ring, or shield sits around the wafer/process area to control plasma exposure, deposition, containment, or mechanical alignment.
Small differences in profile, wafer size, material, and revision can affect process uniformity and chamber compatibility.
Technical guide
Vespel
Polyimide material used for heat-resistant, low-wear parts.
ceramic
Hard, insulating, plasma-resistant material used in some chamber rings and shields.
poly
Polymer material context from the provided evidence; verify exact material grade.
- clamp_ring
- A ring used to hold, locate, or clamp process hardware or wafer-related components.
- focus_ring
- A ring near the wafer edge that helps shape plasma or process conditions.
What to verify before purchase
- Verify exact material grade, profile, diameter, ESC/chamber compatibility, and surface condition.
- Confirm whether this is for a specific wafer size or chamber revision.
Confirm with the seller
- Exact material formulation and tool chamber compatibility are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.