Product description
Shield, L-support, pumping insert
Specifications and identifiers
identification
| Function | Shield / L-support / pumping insert |
|---|
| Context | GECO referenced in some sources |
|---|
mechanical context
| Role | Chamber shield or insert used around pumping geometry. |
|---|
Applications
Process chambersWafer processing hardwareVacuum chamber servicePreventive maintenance kitsPumping insert shield replacementChamber consumable or hardware maintenance
How it works
A mechanical process-tool component used for shielding, spacing, sealing, mounting, confinement, or chamber geometry control.
Material, coating, dimensions, process position, and surface condition can affect plasma behavior, contamination risk, and mechanical fit.
Technical guide
- CVD
- Chemical vapor deposition.
- ESC
- Electrostatic chuck.
- QTZ
- Quartz.
- SST
- Stainless steel.
What to verify before purchase
- Material and coating
- Exact chamber/process match
- Edge wear and cleanliness
Confirm with the seller
- Specific tool serial-number compatibility
- Current calibration or functional test status
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.