Product description
Applied Materials 0200-18086 ceramic nozzle, described as .85L for HDPCVD Ultima context.
Specifications and identifiers
identification
| Description | Ceramic nozzle |
|---|
| Reported context | HDPCVD Ultima |
|---|
| Reported size/marking | .85L appears in evidence |
|---|
Equipment context
- Applied Materials HDP-CVD Ultima chamber
Applications
PVD/CVD/etch chamber kitswafer-area consumablesESC and focus-ring stacksGas/process nozzle replacementHDP-CVD chamber ceramic hardwareProcess-facing consumable service
How it works
A shaped process-facing ring or chamber component used near a wafer, chuck, electrode, or gas path.
Geometry, material, coating, and cleanliness can affect plasma behavior, contamination risk, and fit.
Technical guide
aluminum
common lightweight chamber hardware material
ceramic
electrically insulating, process-compatible material used in chamber hardware
quartz
high-purity silica glass used in plasma or high-temperature environments
- ESC
- electrostatic chuck
What to verify before purchase
- Verify nozzle dimensions and .85L marking
- Inspect for chips, erosion, and contamination
- Confirm exact Ultima chamber configuration
Confirm with the seller
- Exact ceramic material grade is not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.