Product description
Rotation susceptor for 200 mm EPI chamber use, R3 context.
Specifications and identifiers
supported details
| Size | 200 mm Supported by repeated evidence |
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| Application | EPI rotation susceptor Supported by repeated evidence |
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| Variant/context | R3 Appears in evidence |
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Applications
Epitaxy chambersRotating wafer support systemsHigh-temperature process modulesEPI wafer supportRotating susceptor replacement200 mm chamber service
How it works
A susceptor supports and often thermally couples a wafer during epitaxy or other high-temperature processes.
Susceptor material, geometry, and surface condition affect heat transfer, rotation, and process uniformity.
What to verify before purchase
- Verify material/coating and R3 variant
- Inspect surface wear, chips, coating loss, and flatness
- Confirm chamber fit and rotation interface
Confirm with the seller
- Exact EPI tool model is not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.