Product description
Applied Materials 0200-35843 ceramic top pumping ring for Giga-Fill SACVD chamber service.
Specifications and identifiers
identification
| Description | Pumping ring, ceramic top |
|---|
| Process context | Giga-Fill SACVD |
|---|
| Geometry note | C-shape appears in evidence; verify actual geometry |
|---|
Equipment context
- Applied Materials Giga-Fill SACVD chamber
Applications
CVD/PVD/etch chamber kitsplasma-facing ring stacksprocess gas or exhaust flow shapingSACVD chamber pumping/gas-flow hardwareCeramic top ring replacementProcess-facing chamber ring service
How it works
A shaped process-chamber ring used near the wafer, exhaust, or gas-flow region.
Geometry, material, flatness, and cleanliness affect fit, process uniformity, particle control, and chamber protection.
Technical guide
ceramic
A process-compatible insulating material commonly used for high-temperature or plasma-adjacent chamber hardware.
quartz
High-purity silica glass used where thermal and plasma compatibility are important.
What to verify before purchase
- Verify ceramic material/grade and surface finish
- Confirm chamber revision and Giga-Fill SACVD fit
- Inspect for cracks, chips, deposits, and refurbishment quality
Confirm with the seller
- Exact chamber revision and ceramic grade are not confirmed
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.