Product description
200 mm SNNF/Si quartz shadow ring with notch/self-align wording.
Specifications and identifiers
chamber hardware
| Item noun | Shadow ring Repeated identity. |
|---|
| Size | 200 mm Repeated nominal size. |
|---|
| Material | Quartz / Si quartz Quartz wording appears; exact material/coating should be verified. |
|---|
| Feature | Notch/self-align Appears in several descriptions. |
|---|
Applications
etch and deposition process chambersESC and cathode surrounding hardwareconsumable chamber hardware replacementshadow ring replacementwafer edge/process uniformity hardware
How it works
A chamber ring is a shaped process-area component used around wafers, electrodes, shields, or chamber openings.
Rings influence plasma confinement, edge exclusion, process uniformity, and protection of more expensive chamber hardware.
Technical guide
Vespel
High-performance polyimide used in some confinement or insulating ring applications.
quartz
High-purity ceramic material often used where thermal and plasma compatibility are important.
tantalum/titanium
Metals used in PVD-related chamber hardware when process compatibility requires them.
What to verify before purchase
- Verify notch count/self-align features and exact quartz/Si quartz material.
- Inspect for chips, process deposits, and cleaned condition.
Confirm with the seller
- Exact tool configuration and compatibility are not confirmed beyond the part identity.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.