| Description | Shield, process chamber floor |
|---|---|
| Platform context | M2000 / Varian process chamber |
A process-facing ring, liner, shield, or ceramic/quartz chamber component used around the wafer or chamber opening.
Geometry, material, surface condition, and cleanliness affect process uniformity, plasma behavior, particle risk, and fit.
ceramic material used where electrical insulation and plasma compatibility are needed
common chamber hardware material when compatible with the process
high-purity silica glass used for plasma-facing or high-temperature parts
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