Product description
Applied Materials 3750-01112 Astex plasma source tube, described as sapphire or quartz plasma source tube with 1/4 VCR connection; associated with FI20101 and AX7610-5 references.
Specifications and identifiers
identification
| Supplier/model context | Astex FI20101 / AX7610-5 |
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| Material wording | Sapphire and quartz source-tube descriptions both occur; verify actual tube material |
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| Connection | 1/4 VCR reported |
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Applications
PVD/CVD chamber kitsESC and cathode stacksprocess chamber liner and shield replacementRemote plasma source tube replacementGas/plasma delivery path componentPlasma source maintenance
How it works
A process-facing ring, liner, shield, or ceramic/quartz chamber component used around the wafer or chamber opening.
Geometry, material, surface condition, and cleanliness affect process uniformity, plasma behavior, particle risk, and fit.
Technical guide
alumina
ceramic material used where electrical insulation and plasma compatibility are needed
aluminum
common chamber hardware material when compatible with the process
quartz
high-purity silica glass used for plasma-facing or high-temperature parts
- ESC
- electrostatic chuck
- PVD
- physical vapor deposition
What to verify before purchase
- Verify material marking and model number
- Inspect tube for cracks, discoloration, or erosion
- Confirm 1/4 VCR and plasma-source compatibility
Confirm with the seller
- Exact tube material should be verified from markings
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.