AE 3150275-007 4MHz Bias RF Match 2.5kW RFPP Advanced Energy 660-095275-005 LAMAE 3150275-007 4MHz Bias RF Match 2.5kW RFPP Advanced Energy 660-095275-005 LAMAE 3150275-007 4MHz Bias RF Match 2.5kW RFPP Advanced Energy 660-095275-005 LAMADVANCED ENERGY 3150275-007 RF MATCH / LAM RESEARCH 660-095275-005 2500W @ 4MHZADVANCED ENERGY 3150275-007 RF MATCH / LAM RESEARCH 660-095275-005 2500W @ 4MHZADVANCED ENERGY 3150275-007 RF MATCH / LAM RESEARCH 660-095275-005 2500W @ 4MHZADVANCED ENERGY 3150275-007 RF MATCH / LAM RESEARCH 660-095275-005 2500W @ 4MHZADVANCED ENERGY 3150275-007 RF MATCH / LAM RESEARCH 660-095275-005 2500W @ 4MHZADVANCED ENERGY 3150275-007 RF MATCH / LAM RESEARCH 660-095275-005 2500W @ 4MHZLAM / Advanced Energy: MATCH, BIAS, 4 MHZ, 2.5 KW, EXP RN PN 660-095275-005
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LAM RESEARCH 660-095275-005

4 MHz 2.5 kW Bias RF Match

Market Availability & Pricing

Part number660-095275-005
ManufacturerLAM RESEARCH
Current availabilitySee listings below
Latest completed listing with reported sales3350 (currency not captured) — public listing price; reported sold quantity is not a verified transaction
Electrical › RF Power › RF Matching Networks
4 MHz 2.5 kW Bias RF Match
LAM RESEARCH660-095275-005bias RF match
Product description
Lam Research 660-095275-005 / Advanced Energy 3150275-007 bias RF match, 4 MHz, 2.5 kW.
Specifications and identifiers
identified attributes
FunctionBias RF match
RF matching network used in bias power delivery.
Frequency4 MHz
Supported by provided evidence.
Power rating2.5 kW
Supported by provided evidence.
Associated vendor partAdvanced Energy 3150275-007
Verify exact label and Lam cross-reference.
Equipment context
  • Lam Research bias RF subsystem
Applications
plasma etchPECVDPVD sputteringwafer-clean or preclean chambersbias RF matchingplasma chamber RF power deliveryLam chamber RF subsystem service
How it works

An RF power subsystem component used to generate, match, or deliver radio-frequency energy to a process chamber.

RF components are highly configuration-dependent; frequency, power rating, connector style, and matching-network compatibility must be verified.

Technical guide
bias_rf_match

A bias RF match tunes the impedance between an RF bias generator and chamber electrode/chuck to reduce reflected power.

Bias RF
RF power applied to control ion energy at a wafer or electrode.
RFPP
RF power product/platform context; verify exact meaning.
What to verify before purchase
  • Frequency and power rating
  • Connector/cooling configuration
  • Advanced Energy and Lam part-number cross-reference
  • Revision and tuning configuration
Confirm with the seller
  • Exact Lam chamber platform

Product reference only. Confirm fitment, revision, included components, and specifications before purchase.

Documentation

No public documents were listed for this part when captured.

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