Product description
Lam chamber arm / harmonic arm, Rev F context.
Specifications and identifiers
supported identity
| Item type | Arm chamber / harmonic arm chamber Mechanical arm component for chamber-related motion or positioning. |
|---|
| Revision observed | Rev F Repeated revision wording; verify marking. |
|---|
Applications
process chambersPVD/CVD/etch hardwarewafer-edge controlgas distribution or chamber shieldingChamber arm replacementMotion/mechanical linkage service
How it works
A process-chamber mechanical or consumable component shaped for a specific wafer size, chamber location, or process module.
Geometry, material, coating, cleanliness, and wafer-size compatibility can directly affect plasma behavior, particle control, and fit.
Technical guide
possible
ceramic, quartz, silicon, aluminum, stainless steel, titanium, or coated metals may be used depending on the specific component; only listed materials should be treated as confirmed
- CVD
- chemical vapor deposition
- ESC
- electrostatic chuck
- HDP-CVD
- high-density plasma chemical vapor deposition
- PVD
- physical vapor deposition
What to verify before purchase
- Verify arm geometry, revision, and associated drive or linkage.
Confirm with the seller
- Exact tool configuration and revision compatibility are not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.