C3576 LAM RESEARCH BAFFLE, LOWER, DOMED ELECTRODE, 6" (NEW) 715-011901-006LAM Lower Baffle 715-011901-006 REV. A Semiconductor PartLAM Lower Baffle 715-011901-006 REV. ALAM Lower Baffle 715-011901-006 REV. ALAM Baffle New Model 715-011901-006 REV ALAM Lower Baffle 715-011901-006 REV. ALAM Baffle New Model 715-011901-006 REV ALAM Baffle New Model 715-011901-006 REV ALAM Baffle New Model 715-011901-006 REV A715-011901-006 Rev A LAM Lower Baffle715-011901-006 Rev A LAM Lower Baffle715-011901-006 Rev A LAM Lower BaffleLAM RESEARCH (LAM) 715-011901-006 REV. A - LOWER BAFFLE ELECTRODE715-011901-006 Rev A LAM Lower BaffleLAM RESEARCH (LAM) 715-011901-006 REV. A - LOWER BAFFLE ELECTRODELAM RESEARCH (LAM) 715-011901-006 REV. A - LOWER BAFFLE ELECTRODE
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LAM RESEARCH 715-011901-006

6 inch Lower Domed Electrode Baffle

Market Availability & Pricing

Part number715-011901-006
ManufacturerLAM RESEARCH
Current availabilitySee listings below
Latest completed listing with reported sales99.99 (currency not captured) — public listing price; reported sold quantity is not a verified transaction
Mechanical › Chamber Components › Baffles & Electrodes
6 inch Lower Domed Electrode Baffle
LAM RESEARCH715-011901-006Lower baffle
Product description
Lower baffle / domed electrode baffle, 6 inch context, for Lam Research equipment.
Specifications and identifiers
physical
Component typeLower baffle
Electrode contextDomed electrode
Size context6 inch
revision context
Revision contextRev A
Applications
CVD chambersPVD chambersEtch chambersTransfer modulesLower baffle replacementElectrode-adjacent chamber hardware
How it works

A chamber mechanical component forms part of the process environment, wafer support area, or shielding/lid structure.

Geometry, material, process family, wafer size, surface finish, and cleanliness can affect fit, particles, and process results.

Technical guide
Vespel

High-performance polyimide commonly used for high-temperature and low-wear parts.

ceramic

Used where electrical insulation, heat resistance, or plasma compatibility is needed.

titanium_nitride

TiN coatings/materials are used in some chamber hardware; verify coating and material marking.

ESC
Electrostatic chuck.
SNNF
Tool or process-context abbreviation from the provided evidence; verify exact meaning.
TXZ
Applied Materials chamber/platform context referenced by the provided evidence.
What to verify before purchase
  • Verify diameter, material, revision, surface condition, and electrode/chamber compatibility.
  • Inspect for coating wear, chips, or plasma erosion before reuse.
Confirm with the seller
  • Exact material and target chamber model are not confirmed.

Product reference only. Confirm fitment, revision, included components, and specifications before purchase.

Documentation

No public documents were listed for this part when captured.

Available Listings

Prices and availability may change. Confirm details with the seller.

C3576 LAM RESEARCH BAFFLE, LOWER, DOMED ELECTRODE, 6" (NEW) 715-011901-006

C3576 LAM RESEARCH BAFFLE, LOWER, DOMED ELECTRODE, 6" (NEW) 715-011901-006

USD 990.0000

Observed public listing price, not an accepted sale amount.

Observed active at check time
SG
Condition: NEW
Listed: Mar 8, 2024 07:32 UTC
End recorded: Dec 7, 2024 17:03 UTC
Estimated remaining at check: 1
Estimated sold at check: 0

eBay response captured — Checked Oct 5, 2026 16:21 UTC

Availability has not been rechecked; current availability is unknown.

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