Product description
Lam Research quartz spacer, 284/303 mm, for Lam 9300/9600-style process hardware context indicated.
Specifications and identifiers
configuration
| Material | Quartz QTZ/quartz wording is consistent. |
|---|
| Size | 284/303 mm Likely a dimensional range or mating diameter; verify from drawing. |
|---|
| Platform context | Lam 9300 / 9600 indicated Platform context appears in evidence but exact chamber configuration should be verified. |
|---|
process context
| Function | Spacer Maintains spacing or alignment in a process module. |
|---|
Applications
etch chambersCVD chambersPVD chambersplasma-facing consumablesquartz process-module spacingplasma chamber consumable/hardware
How it works
A quartz, ceramic, or silicon process component is used near the wafer or plasma/process environment.
Material purity, coating, surface condition, dimensions, and process compatibility can affect contamination, plasma behavior, and tool fit.
Technical guide
ceramic
Ceramic materials provide electrical insulation, heat resistance, or plasma compatibility when specified.
quartz
High-purity quartz is commonly used for plasma or optical/process-facing components.
plasma_facing
Components near plasma or process gas must be compatible with the chemistry and thermal environment.
- ESC
- Electrostatic chuck.
- PVD
- Physical vapor deposition.
- QTZ
- Quartz.
What to verify before purchase
- dimensions
- quartz condition
- cleanliness and chips/cracks
- platform configuration
Confirm with the seller
- exact process chamber
- material purity grade
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.