Product description
Ring, edge, wafer clamp, 6 inch.
Specifications and identifiers
supported identity
| Function | Wafer clamp edge ring Repeated evidence supports a ring used at the wafer-clamp edge. |
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| Diameter | 6 inch Repeated evidence includes 6-inch wording. |
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| Dimensions clue | 7.0 OD, 5.986 ID, .490 thickness One source provides dimensions; verify from drawing or measurement. |
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Equipment context
- Lam Research / OnTrak equipment
Applications
etch chambersCVD chambersPVD chamberswafer clampingprocess shieldingwafer clamping hardwareedge ring replacementLam process chamber service
How it works
A wafer-contact or process-facing ring, shield, window, pedestal, clamp, or plate used near the wafer/process area.
Diameter, material, coating, cleanliness, notch orientation, and revision directly affect process fit and contamination risk.
Technical guide
evidence_scope
Only material terms supported by provided evidence should be treated as likely.
typical
quartz, ceramic, alumina, stainless steel, Vespel, aluminum, or process-specific coated metals
CVD
chemical vapor deposition
PVD
physical vapor deposition
- 200mm
- 8-inch wafer-class tooling
- 300mm
- 12-inch wafer-class tooling
What to verify before purchase
- Verify exact revision and configuration against tool BOM or installed part markings.
- Confirm physical condition, connector/keying, and cleanliness before installation.
Confirm with the seller
- Exact tool compatibility beyond the supported description.
- Detailed dimensional drawing and full material specification.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.