Lam Research 716-011763-008 Wafer Clamp Edge 8" Edge Ring Rev. 2 Cleaned 3430 LAM Research 716-011763-008 Ring, EDG8IN (Wafer Clam)LAM 716-011763-008 EDGE RING (POLY SIN)LAM 716-011763-008 EDGE RING (POLY SIN)Lam Research 716-011763-008 Wafer Clamp Edge 8" Ring New3430 LAM Research 716-011763-008 Rev. B Ring, EDG8IN (Wafer Clam)Lam Research 716-011763-008 Wafer Clamp Edge 8" Ring New3430 LAM Research 716-011763-008 Rev. B Ring, EDG8IN (Wafer Clam)Lam Research 716-011763-008 Wafer Clamp Edge 8" Ring NewLAM 716-011763-008 EDGE RING (POLY SIN)LAM Research 716-011763-008 Ring Edge 8in WAFERCLAM NIB Sealed LAM 716-011763-008 EDGE RING (POLY SIN)LAM 200MM 716-011763-008 RING EDGE WAFER CLAMPLam Research 716-011763-008 Wafer Clamp Edge 8" Ring NewLam Research 716-011763-008 Wafer Clamp Edge 8" Ring New3430 LAM Research 716-011763-008 Rev. B Ring, EDG8IN (Wafer Clam)
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LAM RESEARCH 716-011763-008

8 in wafer-clamp edge ring

Market Availability & Pricing

Part number716-011763-008
ManufacturerLAM RESEARCH
Current availabilitySee listings below
Latest completed listing with reported sales905.21 (currency not captured) — public listing price; reported sold quantity is not a verified transaction
Mechanical › Chamber Components › Edge Rings
8 in wafer-clamp edge ring
LAM RESEARCH716-011763-008edge ring
Product description
Lam Research 716-011763-008 edge ring / wafer clamp edge ring, 8 in / 200 mm, with poly-silicon wording in one source.
Specifications and identifiers
application notes
Use areaWafer clamp / edge ring area
Geometry is critical for wafer edge and clamp fit.
supported details
Item typeWafer clamp edge ring / edge ring
Size8 in / 200 mm
Both equivalent size references appear.
Material wordingPoly SIN / poly-silicon wording
Verify exact material before substitution.
Revision examplesRev 2, Rev B
Revision must be matched when required.
Applications
plasma etch chambersCVD/PVD process chamberselectrostatic chuck assemblieswafer clamp edge ring replacement200 mm chamber hardware serviceplasma-facing ring replacement
How it works

A chamber ring positioned around or near the wafer area to shape plasma behavior and protect nearby chamber hardware.

Focus and edge rings affect plasma uniformity, wafer-edge conditions, and chamber consumable fit.

Technical guide
poly/polycide

Process-specific material wording should be verified against part markings or OEM documentation before substitution.

ESC

Electrostatic chuck; a chuck that holds the wafer by electrostatic force during processing.

What to verify before purchase
  • Exact size
  • Material
  • Revision
  • Whether item is for wafer clamp or edge ring position
Confirm with the seller
  • Specific chamber model
  • Compatibility with 300 mm hardware
  • Condition after cleaning

Product reference only. Confirm fitment, revision, included components, and specifications before purchase.

Documentation

No public documents were listed for this part when captured.

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